►Know how
The Nano-Rennes platform can etch a whole range of materials either by wet and/or dry etching. Dry etching are made in dedicated reactive ion etching reactors (RIE). Wet etching are performed under dedicated chemical hood.
The platform has know-how in processing the following materials:
- Si-based materials (Si, Si3N4, SiO2, Ge, SiGe, …)
- InP-based materials (InAs, InGaAs, InAlAs, InGaAsP, InAlGaAs)
- Polymers (photoresist, BCB, …) and metals (In, Au, Ti, Ge, …)
►Etching facilities
Dry etching
Plasma cleaner Plasmafab ETA Electrotech (FOTON-INSA)
Gas : O2
Cleaning of remaining resists
Features :
- primary vacuum (10-3 mbar)
Wet etching
►Etching examples