►Objective and course functioning

The Nanorennes platform welcomes more than 300 trainees each year, whether they are students, doctoral students or confirmed researchers.

The training aims to address the basic principles of realization of devices associated with the fields of microelectronics and / or nanophotonics, and this by immersion in a clean room for the realization and characterization of these components.

Supervision is provided either by the qualified staff of the platform or by the teachers (previously trained) from the requesting universities in the case where the universities have included these courses in the curriculum of the students.

 

 

►The different training offers

The platform offers a set of training courses in the fields of microelectronics, photonics, microsystems and sensors.

 

TP	Entitled	Duration (days)	Number of masking levels	Technologies
TP n°1	Realization of multimode quantum well laser diodes for telecoms and characterizations	2.5	1	Photolithography (<0), cathodic sputtering, cleavage. Electro-optical characterization
TP n°2	Realization of single-mode quantum-well laser diodes for telecoms and characterizations	3	2	Photolithography (> 0 and <0), PECVD, RIE, cathodic sputtering, cleavage. Electro-optical characterization
TP n°3	Realization of MOS Silicon transistors and characterizations	2.5	4	Photolithography (> 0), oxidation (wet, dry), diffusion doping, wet etching, Joule evaporator. Electrical characterization
TP n°4	Realization of silicon photodiode and characterizations	2	2	Photolithography (> 0), oxidation (wet, dry), diffusion doping, wet etching, Joule evaporator. Electrical characterization.
TP n°5	Realization of biological sensors in MEMs technology	2.5	–	Photolithography (> 0), oxidation (wet, dry), diffusion doping, wet etching, Joule evaporator. Electrical characterization