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Cleanroom characterization


The Nano-Rennes platform has a set of tools in clean rooms that allow ongoing control and characterization of processes. These tools fall into two categories:

  • Control tools
  • Metrology tools


►Description of clean rooms characterisation equipment

Control tools


4 Olympus microscopes (IETR-GM, FOTON-INSA)

  • Magnification from ×50 to ×200
  • UV filter 
  • Camera




FEG JEOL 7600 scanning electron microscopy (IETR-GM)

  •  5 nm resolution

Metrology tools

Tencor profilometer


Bruker profilometer




2 Tencor and Taylor-Hobson stylos profilometers (IETR-GM, FOTON-INSA)

  • Accuracy: 0,1 %, tip of R=2.5 µm
  • Max. length sweep: 10 cm
  • Scanning speed: from 2 to 200 µm/s
  • Samples dimensions: 4 inches
  • Samples height: up to 17,5 mm
  • Contact force: adjustable from 1 to 100 mg
  • Operating height from some nm to 3 mm
  • Stess measurements


4 pikes Jipelec measurements (IETR-GM)

  • Resistivity characterisation
  • Doping control (Si sector)






3 under pike measuring stations (ITER-GM, FOTON-INSA)
Tektronik 370A: measurements I(V) (AC, DC), low and high voltage (2kV)
Agilent  1500 : measurement I(V), C(V), pulse, max voltage 40V



  • Characteristics plotter coupled to an under pike measurement system 
  • Micrometric displacement
  • Visualisation by microscope or binocular


Notes :

  • A measuring station reserved for training
  • Component characteristics, square resistance measurement (TLM method), resistivity measurement 


2 under spike measuring stations in glove box  (IETR-GM)

  • Characteristics plotter coupled to an under spike measurement system
  • Micrometric displacement
  • Visualisation by microscope or binocular



Spectroscopic Horiba ellipsometer (IETR-GM)

  • Spectral range : 200-2100 nm
  • Goniometer 40-90°
  • µ-spot (50 µm to 1 mm)


►Examples of achievements

Sanning Electron Microscopy (SEM) shots