Nanorennes equiments are gathered within two cleanrooms and separate rooms.
250 m² of cleanrooms, in a 10 000 class environment (100 for lithography) :
► 130 m² of cleanroom with facilities for III-V based nanophotonic (FOTON-OHM) (plan de la SB)
► 150 m² of cleanroom with facilities for Si based nano-microelectroncis (IETR-GM) (IETR clean Room)
Si dedicated clean room of IETR with also polymer area for microfluidic patterning.
More than 500 m² dedicated to :
► material growth (1 GS-MBE III-V, 1 SS-MBE III-V UHV coupled to an UHV-LPCVD Si). IETR could provide 4 LPCVD Si and
4PECVD dedicated to Si deposition at low T°C as sputt RF and organic joule evaporator,
linked with glove boxes (plan of thin film deposition area).
Thin Film deposition area, with LPCVD PECVD Sputt an organic evaporation in glove box
► structural characterizations (2 AFMs, 1 DDX, SEM)
► electrical characterizations facilities (Hall measurements, I(V) and C(V) prober stations *3)
► optical characterizations facilities (photoluminescence, absorption, pump-probe)