►Know-how
The Nano-Rennes platform has a set of tools in clean rooms that allow ongoing control and characterization of processes. These tools fall into two categories:
- Control tools
- Metrology tools
►Description of clean rooms characterisation equipment
Control tools
4 Olympus microscopes (IETR-GM, FOTON-INSA)
- Magnification from ×50 to ×200
- UV filter
- Camera
FEG JEOL 7600 scanning electron microscopy (IETR-GM)
- 5 nm resolution
Metrology tools
2 Tencor and Taylor-Hobson stylos profilometers (IETR-GM, FOTON-INSA)
- Accuracy: 0,1 %, tip of R=2.5 µm
- Max. length sweep: 10 cm
- Scanning speed: from 2 to 200 µm/s
- Samples dimensions: 4 inches
- Samples height: up to 17,5 mm
- Contact force: adjustable from 1 to 100 mg
- Operating height from some nm to 3 mm
- Stess measurements
4 pikes Jipelec measurements (IETR-GM)
- Resistivity characterisation
- Doping control (Si sector)
3 under pike measuring stations (ITER-GM, FOTON-INSA)
Tektronik 370A: measurements I(V) (AC, DC), low and high voltage (2kV)
Agilent 1500 : measurement I(V), C(V), pulse, max voltage 40V
- Characteristics plotter coupled to an under pike measurement system
- Micrometric displacement
- Visualisation by microscope or binocular
Notes :
- A measuring station reserved for training
- Component characteristics, square resistance measurement (TLM method), resistivity measurement
2 under spike measuring stations in glove box (IETR-GM)
- Characteristics plotter coupled to an under spike measurement system
- Micrometric displacement
- Visualisation by microscope or binocular
Spectroscopic Horiba ellipsometer (IETR-GM)
- Spectral range : 200-2100 nm
- Goniometer 40-90°
- µ-spot (50 µm to 1 mm)
►Examples of achievements
Sanning Electron Microscopy (SEM) shots